DocumentCode
2059345
Title
Investigation of silicon anisotropic etching in alkaline solutions with propanol addition
Author
Jovic, V. ; Lamovec, J. ; Popovic, M.
Author_Institution
Dept. of Microelectron. Technol. & Single Crystals, Belgrade Univ., Belgrade
fYear
2008
fDate
11-14 May 2008
Firstpage
355
Lastpage
358
Abstract
Different propanol isomers additives to 26 wt. % KOH water solution have been studied. It was stated that addition of both isomers result in changing etching anisotropy of (110) oriented corners on Si (100). For the same etching depth, IPA addition causes higher corner undercutting than 1-propanol addition. Surface topography is better in IPA containing solutions.
Keywords
additives; etching; surface topography; Si; alkaline solutions; propanol isomers additives; silicon anisotropic etching; surface topography; Anisotropic magnetoresistance; Chemicals; Dry etching; Fabrication; Microelectronics; Micromachining; Silicon; Surface contamination; Surface topography; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronics, 2008. MIEL 2008. 26th International Conference on
Conference_Location
Nis
Print_ISBN
978-1-4244-1881-7
Electronic_ISBN
978-1-4244-1882-4
Type
conf
DOI
10.1109/ICMEL.2008.4559295
Filename
4559295
Link To Document