DocumentCode :
2060394
Title :
Electron-beam-induced deposition of conductive nanostructures with carbon nanotube emitters
Author :
Arai, Fumihito ; Liu, Pou ; Dong, Lixin ; Nakajima, Masahiro ; Fukuda, Toshio
Author_Institution :
Dept. of Micro Syst. Eng., Nagoya Univ., Japan
Volume :
2
fYear :
2003
fDate :
12-14 Aug. 2003
Firstpage :
811
Abstract :
Electron-beam-induced deposition (EBID) with two kinds of organometallic compounds including tungsten hexacarbonyle (W(CO)6) and dimethyl-gold ((CH3)2(C5H7O2)Au) as precursors is presented so as to obtain conductive nanostructures. Their resistivity and growth rate are measured, and the composition of deposits are analyzed. To improve the resolution of the deposit and energy consumption, EBID with multiwalled carbon nanotubes (MWNTs) as emitters is demonstrated. In the deposit at anode by using W(CO)6, mass of the tungsten reaches up to 80% among the compositions.
Keywords :
carbon nanotubes; electrical resistivity; electron beam deposition; organometallic compounds; thin films; C; MWNT; conductive nanostructures; dimethyl gold; electron beam induced deposition; energy consumption; growth rate; multiwalled carbon nanotubes emitters; organometallic compounds; resistivity; tungsten hexacarbonyle W(CO)6; Carbon dioxide; Carbon nanotubes; Conductivity; Electron tubes; Glass; Heating; Nanostructures; Systems engineering and theory; Temperature; Tungsten;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology, 2003. IEEE-NANO 2003. 2003 Third IEEE Conference on
Print_ISBN :
0-7803-7976-4
Type :
conf
DOI :
10.1109/NANO.2003.1231038
Filename :
1231038
Link To Document :
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