DocumentCode
2075729
Title
About the mechanisms of femtosecond laser damage and ablation of dielectric materials
Author
Utéza, O. ; Chimier, B. ; Sanner, N. ; Sentis, M. ; Itina, T. ; Lassonde, P. ; Legaré, F. ; Vidal, F. ; Kieffer, J.C.
Author_Institution
LP3, Univ. de la Mediterranee, Marseille, France
fYear
2011
fDate
22-26 May 2011
Firstpage
1
Lastpage
1
Abstract
In this paper, we perform a simple experiment to precisely evaluate in the same operating conditions the behaviour of the damage and ablation thresholds under the wide excursion of a single experimental interaction parameter, i.e. the laser pulse duration. The experiments are done at 800 nm in single shot regime to avoid any incubation effects. We then measure and model the damage and ablation thresholds at the surface of a well-known dielectric material, e.g. fused silica, using pulses ranging from 7 fs to 300 fs. The relevant criteria to numerically assess the damage and ablation thresholds are related to the lattice melting temperature Tm and the electronic cohesion temperature Tec, in accordance with experimental observations.
Keywords
dielectric materials; laser ablation; ablation thresholds; dielectric materials; electronic cohesion temperature; femtosecond laser damage; fused silica; incubation effects; laser ablation; laser pulse duration; lattice melting temperature; time 7 fs to 300 fs; wavelength 800 nm;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Europe (CLEO EUROPE/EQEC), 2011 Conference on and 12th European Quantum Electronics Conference
Conference_Location
Munich
ISSN
Pending
Print_ISBN
978-1-4577-0533-5
Electronic_ISBN
Pending
Type
conf
DOI
10.1109/CLEOE.2011.5943335
Filename
5943335
Link To Document