• DocumentCode
    2075729
  • Title

    About the mechanisms of femtosecond laser damage and ablation of dielectric materials

  • Author

    Utéza, O. ; Chimier, B. ; Sanner, N. ; Sentis, M. ; Itina, T. ; Lassonde, P. ; Legaré, F. ; Vidal, F. ; Kieffer, J.C.

  • Author_Institution
    LP3, Univ. de la Mediterranee, Marseille, France
  • fYear
    2011
  • fDate
    22-26 May 2011
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    In this paper, we perform a simple experiment to precisely evaluate in the same operating conditions the behaviour of the damage and ablation thresholds under the wide excursion of a single experimental interaction parameter, i.e. the laser pulse duration. The experiments are done at 800 nm in single shot regime to avoid any incubation effects. We then measure and model the damage and ablation thresholds at the surface of a well-known dielectric material, e.g. fused silica, using pulses ranging from 7 fs to 300 fs. The relevant criteria to numerically assess the damage and ablation thresholds are related to the lattice melting temperature Tm and the electronic cohesion temperature Tec, in accordance with experimental observations.
  • Keywords
    dielectric materials; laser ablation; ablation thresholds; dielectric materials; electronic cohesion temperature; femtosecond laser damage; fused silica; incubation effects; laser ablation; laser pulse duration; lattice melting temperature; time 7 fs to 300 fs; wavelength 800 nm;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics Europe (CLEO EUROPE/EQEC), 2011 Conference on and 12th European Quantum Electronics Conference
  • Conference_Location
    Munich
  • ISSN
    Pending
  • Print_ISBN
    978-1-4577-0533-5
  • Electronic_ISBN
    Pending
  • Type

    conf

  • DOI
    10.1109/CLEOE.2011.5943335
  • Filename
    5943335