DocumentCode
2093620
Title
Selective oxidation and successive wet etching for freestanding structure of magneto-optic waveguide
Author
Yokoi, Hideki ; Shoji, Yuya ; Mizumoto, Tetsuya
Author_Institution
Dept. of Electr. & Electron. Eng., Tokyo Inst. of Technol., Japan
fYear
2003
fDate
18-21 Aug. 2003
Firstpage
75
Lastpage
76
Abstract
A magneto-optic waveguide with a semiconductor guiding layer was studied for an optical isolator employing a nonreciprocal phase shift. Freestanding structure of the waveguide was obtained by selective oxidation and successive wet etching.
Keywords
etching; integrated optics; magneto-optical devices; optical communication equipment; optical fabrication; optical isolators; optical waveguides; oxidation; semiconductor materials; magneto-optic waveguide; nonreciprocal phase shift; optical isolator; selective oxidation; semiconductor guiding layer; wet etching; Electromagnetic waveguides; Isolators; Magnetooptic effects; Optical interferometry; Optical refraction; Optical surface waves; Optical variables control; Optical waveguides; Oxidation; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical MEMS, 2003 IEEE/LEOS International Conference on
Print_ISBN
0-7803-7830-X
Type
conf
DOI
10.1109/OMEMS.2003.1233474
Filename
1233474
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