DocumentCode :
2093966
Title :
Photonic crystal switch by inserting nano-crystal defects using MEMS actuator
Author :
Kanamori, Y. ; Inoue, K. ; Horie, K. ; Hane, K.
Author_Institution :
Dept. of Mechatronics & Precision Eng., Tohoku Univ., Sendai, Japan
fYear :
2003
fDate :
18-21 Aug. 2003
Firstpage :
107
Lastpage :
108
Abstract :
A novel photonic crystal switch by inserting crystal defects using a MEMS actuator was proposed. Optical parameters for obtaining photonic crystal switch were determined. The number of air holes necessary for light switching, and allowable gaps between the air hole and silicon rod, were decided by a FDTD simulation. The fabrication techniques using electron beam lithography, fast atom beam etching and HF gas-phase etching were proposed.
Keywords :
crystal defects; electron beam lithography; electrostatic actuators; etching; finite difference time-domain analysis; micro-optics; microswitches; nanostructured materials; optical fabrication; optical switches; photonic crystals; FDTD simulation; HF gas-phase etching; MEMS actuator; air holes; electron beam lithography; fabrication techniques; fast atom beam etching; light switching; nanocrystal defects; photonic crystal switch; silicon rod; Actuators; Atom optics; Electron optics; Etching; Finite difference methods; Micromechanical devices; Optical switches; Photonic crystals; Silicon; Time domain analysis;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical MEMS, 2003 IEEE/LEOS International Conference on
Print_ISBN :
0-7803-7830-X
Type :
conf
DOI :
10.1109/OMEMS.2003.1233489
Filename :
1233489
Link To Document :
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