Title :
Stabilized droplet target delivery for high power EUV generation for lithography
Author :
Cunado, Jose ; Takenoshita, Kazutoshi ; George, Simi A. ; Schmid, Tobias ; Bernath, Robert ; Brown, Christopher ; Duncan, Joshua ; Richardson, Martin C.
Author_Institution :
Univ. of Central Florida, Orlando
Abstract :
A stabilized targeting scheme is installed in the EUV light source facility and performs high level of stability of tin-doped droplet target positioning for a long term, which is required for the EUVL sources.
Keywords :
drops; light sources; solid lasers; ultraviolet lithography; EUV generation; extreme ultraviolet emission; light source; lithography; stabilized droplet target delivery; Light sources; Lighting; Lithography; Nonhomogeneous media; Optical pulses; Optical sensors; Power generation; Pump lasers; Target tracking; Ultraviolet sources;
Conference_Titel :
Lasers and Electro-Optics Society, 2007. LEOS 2007. The 20th Annual Meeting of the IEEE
Conference_Location :
Lake Buena Vista, FL
Print_ISBN :
978-1-4244-0925-9
Electronic_ISBN :
1092-8081
DOI :
10.1109/LEOS.2007.4382490
