DocumentCode
2102841
Title
ZnO thin films for high frequency SAW devices
Author
Ieki, H. ; Kadota, Mitsuhiro
Author_Institution
Murata Manuf. Co. Ltd., Kyoto, Japan
Volume
1
fYear
1999
fDate
17-20 Oct. 1999
Firstpage
281
Abstract
Sezawa wave on a ZnO/sapphire substrate is applied to low insertion loss surface acoustic wave (SAW) filters in microwave band of 1.5 GHz to 2.5 GHz range. RF planar magnetron sputtering (RF-Mg) is used for the fabrication of epitaxial ZnO film. Sputtering conditions and the dopant are decided to realize a stable and reproducible process. Details of ZnO epitaxial growth and practical application results are reviewed. To improve the piezoelectric properties of ZnO film, electron cyclotron resonance (ECR) sputtering is investigated. The ZnO/quartz substrate has small temperature coefficient of frequency (TCF) and medium electromechanical coupling coefficient (ks) comparable to ST cut quartz and Li2B4O7 respectively. Theoretical and experimental results are also discussed.
Keywords
II-VI semiconductors; piezoelectric thin films; semiconductor epitaxial layers; sputter deposition; surface acoustic wave filters; vapour phase epitaxial growth; zinc compounds; 1.5 to 2.5 GHz; Al2O3; RF planar magnetron sputtering; SAW filters; Sezawa wave; ZnO; ZnO/sapphire substrate; electromechanical coupling coefficient; epitaxial growth; high frequency SAW devices; piezoelectric properties; thin films; Acoustic waves; Frequency; Insertion loss; Magnetic separation; Piezoelectric films; Sputtering; Substrates; Surface acoustic wave devices; Thin film devices; Zinc oxide;
fLanguage
English
Publisher
ieee
Conference_Titel
Ultrasonics Symposium, 1999. Proceedings. 1999 IEEE
Conference_Location
Caesars Tahoe, NV
ISSN
1051-0117
Print_ISBN
0-7803-5722-1
Type
conf
DOI
10.1109/ULTSYM.1999.849403
Filename
849403
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