DocumentCode
21030
Title
Modeling the Impact of Reset Depth on Vacancy-Induced Filament Perturbations in
RRAM
Author
Raghavan, N. ; Degraeve, Robin ; Fantini, Andrea ; Goux, L. ; Wouters, D.J. ; Groeseneken, Guido ; Jurczak, Malgorzata
Author_Institution
Emerging Memories Group, Imec, Heverlee, Belgium
Volume
34
Issue
5
fYear
2013
fDate
May-13
Firstpage
614
Lastpage
616
Abstract
Random telegraph noise in resistive switching memory devices is governed by two distinct mechanisms-oxygen vacancy perturbations in the filament as well as the electron trapping-detrapping phenomenon. In this letter, we focus on the dominant role of vacancies in governing the stability of the filament in the high resistance state and characterize the dependence of the read disturb voltage (VDIST) on the depth of the reset level during switching. Our slow voltage ramp read disturb tests at different reset levels indicate the possibility of filamentary instability even for read voltages lower than the standard value of 0.10 V. These experimental trends can be well explained using the quantum point contact model for conduction in the filament, as deeper reset levels induce very steep potential gradients at the two ends of the constriction that make the filaments highly unstable and susceptible to structural modifications due to vacancy generation and/or transport during memory read operation.
Keywords
hafnium compounds; high-k dielectric thin films; integrated circuit modelling; integrated circuit noise; quantum point contacts; random noise; random-access storage; vacancies (crystal); HfO2; RRAM; electron trapping-detrapping phenomenon; oxygen vacancy perturbations; quantum point contact model; random telegraph noise; read disturb voltage; reset depth impact modelling; resistive switching memory devices; steep potential gradients; vacancy-induced filament perturbations; voltage ramp read disturb tests; High resistance state (HRS); hourglass (HG) model; oxygen vacancy; quantum point contact (QPC); random telegraph noise (RTN); resistive random access memory (RRAM);
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2013.2254462
Filename
6502198
Link To Document