DocumentCode :
21054
Title :
Compact Ga-Doped ZnO Nanorod Thin Film for Making High-Performance Transparent Resistive Switching Memory
Author :
Chun-Yang Huang ; Yen-Ting Ho ; Chung-Jung Hung ; Tseung-Yuen Tseng
Author_Institution :
Dept. of Electron. EngineeringInstitute of Electron., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Volume :
61
Issue :
10
fYear :
2014
fDate :
Oct. 2014
Firstpage :
3435
Lastpage :
3441
Abstract :
Fully transparent and stable resistive switching characteristics in resistive random access memory (RRAM) device consisting of ITO/Ga doped ZnO (GZO)/ZnO/ITO architecture are proposed. The GZO nanorods with well aligned and extremely dense properties are considered as a thin film for RRAM device. The oxygen vacancies can be confined and migrate along grain boundaries in the GZO nanorod film. Therefore, the weakest point for formation and rupture of conductive filament can be limited at the interface between GZO nanorod film and ZnO seeding layer. Compared with ITO/ZnO/ITO device, a significant improvement in the distribution of high resistance state (HRS) and low resistance state (LRS) during resistance switching is demonstrated in the present device. In addition, a high endurance of more than 7000 cycles with the resistance ratios of HRS/LRS about 200 times is achieved in this device. The ITO/GZO/ZnO/ITO device is a good candidate for the transparent RRAM application.
Keywords :
III-V semiconductors; gallium; grain boundaries; indium compounds; nanoelectronics; nanorods; random-access storage; semiconductor thin films; switching circuits; tin compounds; vacancies (crystal); wide band gap semiconductors; zinc compounds; HRS; LRS; RRAM device; ZnO:Ga; ZnO:ITO; compact nanorod thin film; conductive filament; fully transparent switching characteristics; grain boundaries; high resistance state distribution; high-performance transparent resistive switching memory; low resistance state; oxygen vacancies; resistive random access memory; seeding layer; stable resistive characteristics; Electrodes; Grain boundaries; Indium tin oxide; Nanoscale devices; Resistance; Switches; Zinc oxide; Endurance; Ga doped; ZnO; grain boundary; nanorod; orientation; resistive random access memory (RRAM); resistive switching (RS); transparent;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2014.2343631
Filename :
6875903
Link To Document :
بازگشت