• DocumentCode
    2117786
  • Title

    Three Dimensional Monte Carlo Simulation Of Ion Implantation With Octree Based Point Location

  • Author

    Stippel, H. ; Selberherr, S.

  • Author_Institution
    Technical University of Vienna
  • fYear
    1993
  • fDate
    14-15 May 1993
  • Firstpage
    122
  • Lastpage
    123
  • Keywords
    Computational geometry; Computational modeling; Implants; Ion implantation; Microelectronics; Semiconductor device modeling; Semiconductor devices; Solid modeling; Statistics; Trajectory;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Process and Device Modeling, 1993. (1993 VPAD) 1993 International Workshop on
  • Print_ISBN
    0-7803-1338-0
  • Type

    conf

  • DOI
    10.1109/VPAD.1993.724750
  • Filename
    724750
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2117786