DocumentCode :
2119449
Title :
15th IEEE International Conference on Advanced Thermal Processing of Semiconductors
fYear :
2007
fDate :
2-5 Oct. 2007
Abstract :
The following topics are discussed: semiconductor doping, advanced logic technologies, laser annealing, microwave annealing, rapid thermal annealing, interface engineering, diffusion, nanovoids, nanostructured materials, thermal stability, curing.
Keywords :
curing; diffusion; laser beam annealing; nanostructured materials; rapid thermal annealing; semiconductor doping; thermal stability; IEEE International Conference; advanced logic technologies; advanced thermal processing; curing; diffusion; interface engineering; laser annealing; microwave annealing; nanostructured materials; nanovoids; rapid thermal annealing; semiconductor doping; thermal stability;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Thermal Processing of Semiconductors, 2007. RTP 2007. 15th International Conference on
Conference_Location :
Catania, Sicily
Print_ISBN :
978-1-4244-1227-3
Type :
conf
DOI :
10.1109/RTP.2007.4383797
Filename :
4383797
Link To Document :
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