DocumentCode :
2121028
Title :
Anomalous Short-channel Body Coefficients Due To Transient Enhanced Diffusion
Author :
Rafferty, C.S. ; Giles, MD ; Vuong, H.H. ; Eshraghi, S.A. ; Pinto, MR ; Hillenius, SJ
Author_Institution :
AT&T Bell Labs
fYear :
1993
fDate :
14-15 May 1993
Firstpage :
148
Lastpage :
149
Keywords :
Boron; Doping profiles; Implants; Impurities; MOSFET circuits; Oxidation; Predictive models; Rapid thermal annealing; Semiconductor process modeling; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Process and Device Modeling, 1993. (1993 VPAD) 1993 International Workshop on
Print_ISBN :
0-7803-1338-0
Type :
conf
DOI :
10.1109/VPAD.1993.724763
Filename :
724763
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2121028
