DocumentCode :
2122909
Title :
Design of GDSII pattern conversion system
Author :
Xing-yu, Wang ; Ying-ding, Zhao
Author_Institution :
College of Computer and Information Engineering, Jiangxi Agricultural University, Nanchang, China
fYear :
2010
fDate :
4-6 Dec. 2010
Firstpage :
4503
Lastpage :
4505
Abstract :
The maskless lithography technology based on Digital micromirror Device is a new way to achieve the goal of large-scale, rapid, flexible lithography. In order to meet the needs of maskless lithography system, Reading and digitization of GDSII file was studied in this paper, the system of pattern conversion was developed, so as to the layout of GDSII can be converted to a digital lithography pattern on DMD. The core layer and interactive layer of system were designed based on the UML method in J2EE. The core layer realized the reading and display of GDSII file. Interactor offeres friendly user interface for core layer.
Keywords :
CMOS integrated circuits; Computers; Educational institutions; Java; Lithography; Logic gates; Unified modeling language; Bitmap; Conversion of format; DMD; GDSII; UML;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Information Science and Engineering (ICISE), 2010 2nd International Conference on
Conference_Location :
Hangzhou, China
Print_ISBN :
978-1-4244-7616-9
Type :
conf
DOI :
10.1109/ICISE.2010.5690218
Filename :
5690218
Link To Document :
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