DocumentCode :
2123360
Title :
Guided SH-SAW toluene sensors with mesoporous silica sensitive coatings: Increased sensitivity through mesostructuration control
Author :
Tetelin, A. ; Tortissier, G. ; Blanc, L. ; Lachaud, J.-L. ; Dejous, C. ; Rebière, D. ; Boissière, C.
Author_Institution :
Lab. IMS, Univ. de Bordeaux, Bordeaux, France
fYear :
2010
fDate :
1-4 Nov. 2010
Firstpage :
369
Lastpage :
372
Abstract :
Thanks to high specific surface areas, mesoporous silica films have been considered as sensitive coatings for guided shear-horizontal surface acoustic wave toluene sensors. In order to increase their sensitivity, the influence on toluene detection of the structuring agent used in the evaporation-induced-self assembly fabrication process of these inorganic films has been studied. In this paper, F127 block copolymer is compared to cethyltrimethylammonium bromide (CTAB). Sensors coated with 100 nm thick films structured with CTAB show an average sensitivity of 14 Hz.ppm"1 for toluene concentrations in the 130 1040 ppm range at room temperature, which is 4.5 times higher than the sensitivity obtained with films of similar thicknesses and porosities that were structured with F127.
Keywords :
chemical sensors; coatings; mesoporous materials; nanofabrication; nanosensors; organic compounds; self-assembly; silicon compounds; surface acoustic wave sensors; thin films; SiO2; block copolymer; cethyltrimethylammonium bromide; evaporation induced self assembly fabrication process; guided SH-SAW toluene sensor; guided shear horizontal surface acoustic wave toluene sensor; high specific surface areas; inorganic film; mesoporous silica films; mesoporous silica sensitive coating; mesostructuration control; thick film; toluene concentration; toluene detection;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Sensors, 2010 IEEE
Conference_Location :
Kona, HI
ISSN :
1930-0395
Print_ISBN :
978-1-4244-8170-5
Electronic_ISBN :
1930-0395
Type :
conf
DOI :
10.1109/ICSENS.2010.5690233
Filename :
5690233
Link To Document :
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