• DocumentCode
    2124504
  • Title

    Effect of substrate type and thickness on power output of silicon nanowire thermoelectric device

  • Author

    Hsin-Luen Tsai

  • Author_Institution
    Dept. of Electron. Eng., Kao Yuan Univ., Kaohsiung, Taiwan
  • fYear
    2013
  • fDate
    25-26 Feb. 2013
  • Firstpage
    126
  • Lastpage
    129
  • Abstract
    The effects of substrate type and thickness on the performance of silicon nanowire thermoelectric device were investigated. It is found that the increase in the etching time results in the longer nanowires and larger power output. The substrate type has no significant effect on the power generation. Under the same recipes, the I-V characteristics and power outputs were examined for two different thicknesses of N-type substrate. For the thin substrate, the better performance can be attributed to low thickness ratio of silicon bulks to silicon nanwire array and series resistance. In brief, the substrate thickness, silicon nanowire length and nanowire number density are major elements for optimized thermoelectric power generation.
  • Keywords
    elemental semiconductors; etching; nanowires; silicon; thermoelectric conversion; thermoelectric devices; I-V characteristics; N-type substrate thickness; Si; etching time; nanowire number density; optimized thermoelectric power generation; power generation; power output thickness; series resistance; silicon nanowire length; silicon nanowire thermoelectric device; silicon nanwire array; substrate type effect; Arrays; Etching; Nanoscale devices; Silicon; Substrates; Temperature measurement; Thermoelectric devices; electroless etching method; silicon nanowires (SiNWs); thermoelectric device (TED);
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Next-Generation Electronics (ISNE), 2013 IEEE International Symposium on
  • Conference_Location
    Kaohsiung
  • Print_ISBN
    978-1-4673-3036-7
  • Type

    conf

  • DOI
    10.1109/ISNE.2013.6512306
  • Filename
    6512306