DocumentCode
2127696
Title
Dielectric function evolution as Bruggeman method solution
Author
Rotaru, Cristina ; Flueraru, C. ; Nastase, S. ; Rotaru, I.
Author_Institution
Nat. Res. Dev. Inst. for Microtechnol., Bucharest, Romania
Volume
2
fYear
1997
fDate
7-11 Oct 1997
Firstpage
447
Abstract
The ellipsometry is a proper technique for analyzing dielectric response of thin solid films, particularly for polycrystalline silicon. The behavior of dielectric function is usually analyzed by the Effective Medium Approximation (Bruggeman model), which gives three solution. The physical problem has only one solution. In this paper are discussed from a physical point of view the solutions of dielectric function
Keywords
dielectric function; elemental semiconductors; ellipsometry; semiconductor thin films; silicon; Bruggeman method solution; Effective Medium Approximation; Si; dielectric function evolution; dielectric response; ellipsometry; polycrystalline Si; thin solid films; Dielectric thin films; Ellipsometry; Equations; Optical films; Optical refraction; Optical sensors; Optical surface waves; Silicon; Solids; Spectroscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Conference, 1997. CAS '97 Proceedings., 1997 International
Conference_Location
Sinaia
Print_ISBN
0-7803-3804-9
Type
conf
DOI
10.1109/SMICND.1997.651243
Filename
651243
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