DocumentCode :
2128128
Title :
Electrical performances of retrograde versus conventional profile MOSFETs
Author :
Skotnicki, T. ; Bouillon, P.
Author_Institution :
France Telecom, CNET, Grenoble, France
fYear :
1996
fDate :
11-13 June 1996
Firstpage :
152
Lastpage :
153
Abstract :
Based on an improved current formulation, we show that in contrast to some recent reports the loss in current in Retrograde Channel Profile (RCP) devices is not inevitable. It is demonstrated theoretically and confirmed experimentally that when moving the peak of the RCP deeper into the bulk, the loss can be transformed into a significant gain. By applying deep Arsenic RCP we have improved the electrical performances of our 0.18 /spl mu/m (as drawn, 0.12 /spl mu/m electrical) MOSFETs compared with Phosphorus channel MOSFETs. A 12% increase in on-current and an almost 2 decade lower off-current are obtained.
Keywords :
MOSFET; doping profiles; semiconductor doping; MOSFET; current drivability; electrical performance; retrograde channel profile; MOSFETs;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1996. Digest of Technical Papers. 1996 Symposium on
Conference_Location :
Honolulu, HI, USA
Print_ISBN :
0-7803-3342-X
Type :
conf
DOI :
10.1109/VLSIT.1996.507829
Filename :
507829
Link To Document :
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