• DocumentCode
    2128644
  • Title

    The effect of intrinsic capacitance degradation on circuit performance

  • Author

    Changhong Dai ; Walstra, S.V. ; Shiuh-Wuu Lee

  • Author_Institution
    Technol. CAD Dept., Intel Corp., Santa Clara, CA, USA
  • fYear
    1996
  • fDate
    11-13 June 1996
  • Firstpage
    196
  • Lastpage
    197
  • Abstract
    The effects of intrinsic capacitance degradation in deep submicron CMOS technology are investigated. This investigation shows that: the measured C/sub gd/ decreases while C/sub gs/ increases during the accelerated hot-carrier stress with V/sub ds//spl Gt/V/sub gs/>V/sub th/; the simulated degraded circuit performance is improved by inclusion of C/sub gd/ degradation over just including I/sub dsat/ degradation; the inclusion of intrinsic capacitance degradation into performance analysis may be critical to the derivation of realistic hot-carrier reliability evaluation.
  • Keywords
    CMOS integrated circuits; capacitance; circuit analysis computing; hot carriers; integrated circuit modelling; integrated circuit reliability; integrated circuit testing; 31 stage ring oscillator circuit; accelerated hot-carrier stress; circuit performance; deep submicron CMOS technology; hot-carrier reliability evaluation; intrinsic capacitance degradation; performance analysis; Acceleration; Analytical models; CMOS technology; Capacitance measurement; Circuit optimization; Circuit simulation; Degradation; Hot carriers; Performance analysis; Stress measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1996. Digest of Technical Papers. 1996 Symposium on
  • Conference_Location
    Honolulu, HI, USA
  • Print_ISBN
    0-7803-3342-X
  • Type

    conf

  • DOI
    10.1109/VLSIT.1996.507850
  • Filename
    507850