• DocumentCode
    2143643
  • Title

    Investigations on the physical understanding of mobility in MOSFETs - from drift-diffusion to quasi-ballistic

  • Author

    Liu, Hongwei ; Wang, Runsheng ; Huang, Ru ; Zhang, Xing

  • Author_Institution
    Inst. of Microelectron., Peking Univ., Beijing, China
  • fYear
    2008
  • fDate
    20-23 Oct. 2008
  • Firstpage
    400
  • Lastpage
    403
  • Abstract
    This paper provides scattering matrix method to analyze the transport property in nanoscale MOSFETs. A unified mobility model with analytical expression is presented, which can cover the whole range from drift-diffusion to quasi-ballistic region. The inherent mobility reduction in MOSFETs with the shrinking of the channel length is extensively investigated from the theory and well agrees with the experiments, but the low-field free path is nearly constant. It is found that the reduction of measured mobility in nano-MOSFETs is only an apparent phenomenon. The relationship between the low-field mean free path ¿0 and the driving current in nano-MOSFETs is discussed. The results indicate it is the ¿0 instead of apparent mobility that determine the transport characteristics in nano-devices.
  • Keywords
    MOSFET; S-matrix theory; carrier mobility; semiconductor device models; drift-diffusion; inherent mobility reduction; low-field mean free path; nanoscale MOSFET; quasiballistic region; scattering matrix; transport property; unified mobility model; Analytical models; Backscatter; Current measurement; Data mining; Degradation; MOSFETs; Microelectronics; Nanoscale devices; Particle scattering; Quantum mechanics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-2185-5
  • Electronic_ISBN
    978-1-4244-2186-2
  • Type

    conf

  • DOI
    10.1109/ICSICT.2008.4734549
  • Filename
    4734549