DocumentCode
2144374
Title
Influence of the reactive gases nature on Ti(C,N) hard coatings in cathodic vacuum arc deposition
Author
Braic, V. ; Braic, M. ; Balaceanu, M. ; Pavelescu, G.
Author_Institution
Nat. Inst. for Optoelectronics, Bucharest, Romania
fYear
2002
fDate
2002
Firstpage
166
Lastpage
169
Abstract
Ti(C,N) hard coatings were prepared by the cathodic vacuum arc deposition method in a reactive atmosphere consisted of a mixture of either N2+C2H2 or N2+CH4 gases. The influence of the gas composition on the film properties (microhardness, adhesion, deposition rate, phase composition, texture) has been investigated. Optical emission spectroscopy of the reactive plasma was also performed.
Keywords
microhardness; plasma deposited coatings; plasma deposition; titanium compounds; vacuum arcs; vacuum deposited coatings; vacuum deposition; Ti(C,N) hard coatings; adhesion; cathodic vacuum arc deposition method; deposition rate; film properties; gas composition; microhardness; optical emission spectroscopy; phase composition; reactive atmosphere; texture; Adhesives; Atherosclerosis; Atmosphere; Coatings; Gases; Optical films; Plasma properties; Spectroscopy; Substrates; Vacuum arcs;
fLanguage
English
Publisher
ieee
Conference_Titel
Discharges and Electrical Insulation in Vacuum, 2002. 20th International Symposium on
Print_ISBN
0-7803-7394-4
Type
conf
DOI
10.1109/ISDEIV.2002.1027333
Filename
1027333
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