DocumentCode
2146749
Title
Design of silicon hollow waveguide polarizer using multilayer structures
Author
Badreldin, Tarek ; Madkour, Kareem ; Khalil, Diaa
Author_Institution
Mentor Graphics, Cairo, Egypt
fYear
2005
fDate
21-23 Sept. 2005
Firstpage
79
Lastpage
80
Abstract
Integrated in-line polarizers based on hollow waveguide with multilayer sidewalls compatible with MEMS technology are proposed. The proposed design of 4 layers can achieve an extinction ratio of 11 dB/mm with propagation loss of 0.9 DB/mm.
Keywords
elemental semiconductors; integrated optics; micromechanical devices; optical design techniques; optical losses; optical multilayers; optical polarisers; optical waveguide components; silicon; MEMS technology; Si; extinction ratio; hollow waveguide; integrated inline polarizers; multilayer sidewalls; multilayer structures; polarizer design; propagation loss; silicon waveguide; Extinction ratio; Hollow waveguides; Insertion loss; Nonhomogeneous media; Optical fiber polarization; Optical waveguides; Propagation losses; Silicon; Tellurium; Waveguide components;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics, 2005. 2nd IEEE International Conference on
Print_ISBN
0-7803-9070-9
Type
conf
DOI
10.1109/GROUP4.2005.1516410
Filename
1516410
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