DocumentCode
2149164
Title
Breakdown mechanisms in the on-state mode of operation of InAlAs/In xGa1-xAs pseudomorphic HEMTs
Author
Dickmann, J. ; Schildberg, S. ; Geyer, A. ; Maile, B.E. ; Schurr, A. ; Heuthe, S. ; Narozny, P.
Author_Institution
Res. Center, Daimler-Benz AG, Ulm, Germany
fYear
1994
fDate
27-31 Mar 1994
Firstpage
335
Lastpage
338
Abstract
A systematic investigation on the breakdown mechanisms in the on-state mode of operation of pseudomorphic InAlAs/InxGa1-xAs (0.53<x<0.7) HEMTs is presented. From temperature- and composition dependent measurements and burn-out experiments it is demonstrated that on-state breakdown in these devices is dominated by impact ionization and that the location of on state breakdown is the channel layer. The on-state breakdown voltage drops with increasing indium mole fraction in the channel layer
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; impact ionisation; indium compounds; InAlAs-InGaAs; InAlAs/InxGa1-xAs pseudomorphic HEMTs; breakdown mechanisms; burn-out; composition dependent measurements; impact ionization; on-state mode; temperature-dependent measurements; Breakdown voltage; Electric breakdown; HEMTs; Impact ionization; Indium compounds; Indium gallium arsenide; Lattices; MODFETs; PHEMTs; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 1994. Conference Proceedings., Sixth International Conference on
Conference_Location
Santa Barbara, CA
Print_ISBN
0-7803-1476-X
Type
conf
DOI
10.1109/ICIPRM.1994.328238
Filename
328238
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