• DocumentCode
    2149571
  • Title

    Why are SCE overestimated in FD-SOI MOSFETs?

  • Author

    Navarro, C. ; Bawedin, M. ; Andrieu, F. ; Sagnes, B. ; Cristolovcanu, S.

  • Author_Institution
    Inst. d´Electron. du Sud, Univ. de Montpellier 2, Montpellier, France
  • fYear
    2013
  • fDate
    16-20 Sept. 2013
  • Firstpage
    304
  • Lastpage
    307
  • Abstract
    Experimental results show that the measurement and interpretation of short-channel effects (SCE) are misleading in advanced SOI MOSFETs. Part of SCE is due to the parasitic contribution of the back gate via channel coupling. We demonstrate that the contributions of each gate to the overall SCE can be discriminated. Numerical simulations indicate that their mutual relevance depends on the transistor architecture. A pragmatic biasing method is proposed for the reduction of charge sharing and DIBL effects. We present a simple model which is effective in decorrelating the genuine SCE at each gate and can be advantageously applied to device optimization.
  • Keywords
    MOSFET; numerical analysis; semiconductor device measurement; silicon-on-insulator; DIBL effects; FD-SOI MOSFET; channel coupling; charge sharing; device optimization; numerical simulation; pragmatic biasing method; short-channel effects; transistor architecture; Couplings; Electric potential; Films; Logic gates; MOSFET; Threshold voltage; Voltage measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference (ESSDERC), 2013 Proceedings of the European
  • Conference_Location
    Bucharest
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2013.6818879
  • Filename
    6818879