DocumentCode
2149571
Title
Why are SCE overestimated in FD-SOI MOSFETs?
Author
Navarro, C. ; Bawedin, M. ; Andrieu, F. ; Sagnes, B. ; Cristolovcanu, S.
Author_Institution
Inst. d´Electron. du Sud, Univ. de Montpellier 2, Montpellier, France
fYear
2013
fDate
16-20 Sept. 2013
Firstpage
304
Lastpage
307
Abstract
Experimental results show that the measurement and interpretation of short-channel effects (SCE) are misleading in advanced SOI MOSFETs. Part of SCE is due to the parasitic contribution of the back gate via channel coupling. We demonstrate that the contributions of each gate to the overall SCE can be discriminated. Numerical simulations indicate that their mutual relevance depends on the transistor architecture. A pragmatic biasing method is proposed for the reduction of charge sharing and DIBL effects. We present a simple model which is effective in decorrelating the genuine SCE at each gate and can be advantageously applied to device optimization.
Keywords
MOSFET; numerical analysis; semiconductor device measurement; silicon-on-insulator; DIBL effects; FD-SOI MOSFET; channel coupling; charge sharing; device optimization; numerical simulation; pragmatic biasing method; short-channel effects; transistor architecture; Couplings; Electric potential; Films; Logic gates; MOSFET; Threshold voltage; Voltage measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference (ESSDERC), 2013 Proceedings of the European
Conference_Location
Bucharest
Type
conf
DOI
10.1109/ESSDERC.2013.6818879
Filename
6818879
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