DocumentCode :
2151135
Title :
Very high density RF MIM capacitor compatible with VLSI
Author :
Chiang, K.C. ; Lai, Cara H. ; Chin, Alvin ; Kao, H.L. ; McAlister, S.P. ; Chi, C.C.
Author_Institution :
Nano Sci. Tech. Center, Nat. Chiao-Tung Univ., Hsinchu, Taiwan
fYear :
2005
fDate :
12-17 June 2005
Abstract :
We have fabricated RF MIM capacitors, using high-k TiTaO as the dielectric, which show a record high density of 20 fF/μm2. In addition, the capacitors display a small capacitance reduction of only 3.6% over the 100 kHz to 20 GHz range, a low leakage current of 8 pA and a high Q of 120. This was for a typical large 8 pF TiTaO MIM capacitor. The small voltage dependence of the capacitance (ΔC/C) of 770 ppm at 2 GHz, shows that these MIM capacitors are useful for high-precision RF circuits.
Keywords :
MIM devices; VLSI; capacitors; microwave integrated circuits; titanium compounds; 2 GHz; 8 pA; 8 pF; RF MIM capacitor; RF circuits; TiTaO; VLSI; capacitance reduction; dielectric materials; leakage current; Capacitance; Circuits; Displays; High K dielectric materials; High-K gate dielectrics; Leakage current; MIM capacitors; Radio frequency; Very large scale integration; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Symposium Digest, 2005 IEEE MTT-S International
ISSN :
01490-645X
Print_ISBN :
0-7803-8845-3
Type :
conf
DOI :
10.1109/MWSYM.2005.1516582
Filename :
1516582
Link To Document :
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