Title :
High power, high efficiency, AlGaN/GaN HEMT technology for wireless base station applications
Author :
Vetury, Rama ; Wei, Y. ; Green, Daniel S. ; Gibb, S.R. ; Leverich, K. ; Garber, P.M. ; Poulton, M.J. ; Shealy, James B.
Author_Institution :
RF Micro Devices, Infrastructure Product Line, Charlotte, NC, USA
Abstract :
We report AlGaN/GaN high-electron-mobility-transistors (HEMT) on SiC substrates with field modulation plates (FP) of various dimensions and different gate widths. As a measure of the status of GaN technology achieved in this work, small periphery 150 μm HEMT demonstrated a continuous wave (CW) output power density of 22.7 W/mm at 2.14 GHz with power added efficiency (PAE) of 54% when biased at a drain-source voltage (VDS) of 80 V. As a demonstration of the scalability of this technology, a 20-mm-wide device exhibited 100 W CW output power and a simultaneous peak PAE of 55.3% at 2.14 GHz when biased at class AB and VDS=48V. WCDMA measurements on the 20mm part demonstrated ACP of -35 dBc at 42.5 dBm output power and 30% PAE under the same bias condition. Analysis of FP related performance tradeoffs are also presented in this work.
Keywords :
III-V semiconductors; UHF field effect transistors; aluminium compounds; code division multiple access; gallium compounds; high electron mobility transistors; silicon compounds; 100 W; 150 micron; 2.14 GHz; 20 mm; 30 percent; 48 V; 54 percent; 55.3 percent; 80 V; AlGaN-GaN; HEMT technology; WCDMA measurements; continuous wave output power density; field modulation plates; high electron mobility transistors; power added efficiency; wireless base stations; Aluminum gallium nitride; Base stations; Density measurement; Gallium nitride; HEMTs; Power generation; Power measurement; Scalability; Silicon carbide; Voltage;
Conference_Titel :
Microwave Symposium Digest, 2005 IEEE MTT-S International
Print_ISBN :
0-7803-8845-3
DOI :
10.1109/MWSYM.2005.1516636