• DocumentCode
    2154117
  • Title

    Effect of underlayer dummy fills on on-chip transmission line

  • Author

    Tsuchiya, Akira ; Onodera, Hidetoshi

  • Author_Institution
    Dept. of Commun. & Comput. Eng., Kyoto Univ., Kyoto
  • fYear
    2009
  • fDate
    12-15 May 2009
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    This paper discusses the effect of CMP dummy fill on on-chip transmission-lines. In recent fabrication processes that use Cu wire, CMP dummy fill is inserted to suppress the variation of the metal thickness. In high frequency above 10 GHz, the eddy current in the dummy fills affects the characteristics of on-chip transmission-line. However it is not clear that which dummy fill has the strong impact. This paper evaluates the relationship between the effect and the location of dummy fills by a 3D field-solver. The experimental results show that there is a region where the dummy fills have strong impact on the loss characteristics. The effect of the dummy fills in the region is nearly two times larger than that in the other region.
  • Keywords
    chemical mechanical polishing; 3D field solver; CMP dummy fill; chemical mechanical polishing; fabrication process; metal thickness; on-chip transmission line; underlayer dummy; Capacitance; Eddy currents; Electric resistance; Electric variables; Electromagnetic coupling; Fabrication; Frequency; Inductance; Transmission lines; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Signal Propagation on Interconnects, 2009. SPI '09. IEEE Workshop on
  • Conference_Location
    Strasbourg
  • Print_ISBN
    978-1-4244-4490-8
  • Electronic_ISBN
    978-1-4244-4489-2
  • Type

    conf

  • DOI
    10.1109/SPI.2009.5089867
  • Filename
    5089867