DocumentCode
2154117
Title
Effect of underlayer dummy fills on on-chip transmission line
Author
Tsuchiya, Akira ; Onodera, Hidetoshi
Author_Institution
Dept. of Commun. & Comput. Eng., Kyoto Univ., Kyoto
fYear
2009
fDate
12-15 May 2009
Firstpage
1
Lastpage
4
Abstract
This paper discusses the effect of CMP dummy fill on on-chip transmission-lines. In recent fabrication processes that use Cu wire, CMP dummy fill is inserted to suppress the variation of the metal thickness. In high frequency above 10 GHz, the eddy current in the dummy fills affects the characteristics of on-chip transmission-line. However it is not clear that which dummy fill has the strong impact. This paper evaluates the relationship between the effect and the location of dummy fills by a 3D field-solver. The experimental results show that there is a region where the dummy fills have strong impact on the loss characteristics. The effect of the dummy fills in the region is nearly two times larger than that in the other region.
Keywords
chemical mechanical polishing; 3D field solver; CMP dummy fill; chemical mechanical polishing; fabrication process; metal thickness; on-chip transmission line; underlayer dummy; Capacitance; Eddy currents; Electric resistance; Electric variables; Electromagnetic coupling; Fabrication; Frequency; Inductance; Transmission lines; Wire;
fLanguage
English
Publisher
ieee
Conference_Titel
Signal Propagation on Interconnects, 2009. SPI '09. IEEE Workshop on
Conference_Location
Strasbourg
Print_ISBN
978-1-4244-4490-8
Electronic_ISBN
978-1-4244-4489-2
Type
conf
DOI
10.1109/SPI.2009.5089867
Filename
5089867
Link To Document