DocumentCode
2155309
Title
Dehydroxylation of UV fused silica slides via laser irradiation
Author
Fernandes, A.J. ; Kane, D.M. ; Gong, B. ; Lamb, R.N.
Author_Institution
Dept. of Phys., Macquarie Univ., Sydney, NSW, Australia
fYear
2002
fDate
11-13 Dec. 2002
Firstpage
433
Lastpage
436
Abstract
Further advances have been made in the development and understanding of an ultraviolet (UV) laser treatment of fused silica glass. Hydroxyl groups present on the surface can be removed by the treatment. The surface hydroxyl groups affect the surface adhesion and performance of silica in catalysis, chromatography, photonics and microelectronics. This work shows that dehydroxylation via laser irradiation is a thermal process. An analysis technique using mass spectrometry has been developed to elucidate and avoid the effect of hydrocarbon contamination, allowing systematic measurements of dehydroxylation to be performed.
Keywords
laser materials processing; silicon compounds; surface treatment; time of flight mass spectra; SiO2; UV fused silica slides; dehydroxylation; laser irradiation; mass spectrometry; surface hydroxyl groups; Adhesives; Glass; Hydrocarbons; Mass spectroscopy; Microelectronics; Performance analysis; Photonics; Silicon compounds; Surface contamination; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Optoelectronic and Microelectronic Materials and Devices, 2002 Conference on
ISSN
1097-2137
Print_ISBN
0-7803-7571-8
Type
conf
DOI
10.1109/COMMAD.2002.1237283
Filename
1237283
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