• DocumentCode
    2155309
  • Title

    Dehydroxylation of UV fused silica slides via laser irradiation

  • Author

    Fernandes, A.J. ; Kane, D.M. ; Gong, B. ; Lamb, R.N.

  • Author_Institution
    Dept. of Phys., Macquarie Univ., Sydney, NSW, Australia
  • fYear
    2002
  • fDate
    11-13 Dec. 2002
  • Firstpage
    433
  • Lastpage
    436
  • Abstract
    Further advances have been made in the development and understanding of an ultraviolet (UV) laser treatment of fused silica glass. Hydroxyl groups present on the surface can be removed by the treatment. The surface hydroxyl groups affect the surface adhesion and performance of silica in catalysis, chromatography, photonics and microelectronics. This work shows that dehydroxylation via laser irradiation is a thermal process. An analysis technique using mass spectrometry has been developed to elucidate and avoid the effect of hydrocarbon contamination, allowing systematic measurements of dehydroxylation to be performed.
  • Keywords
    laser materials processing; silicon compounds; surface treatment; time of flight mass spectra; SiO2; UV fused silica slides; dehydroxylation; laser irradiation; mass spectrometry; surface hydroxyl groups; Adhesives; Glass; Hydrocarbons; Mass spectroscopy; Microelectronics; Performance analysis; Photonics; Silicon compounds; Surface contamination; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optoelectronic and Microelectronic Materials and Devices, 2002 Conference on
  • ISSN
    1097-2137
  • Print_ISBN
    0-7803-7571-8
  • Type

    conf

  • DOI
    10.1109/COMMAD.2002.1237283
  • Filename
    1237283