Ultra thin metal films for transparent conductive layers

Author

Giurgola, S. ; Vergani, P. ; Lucchi, F. ; Pruneri, V.

Author_Institution

Avanex Corp., San Donato Milanese

fYear

2007

fDate

17-22 June 2007

Firstpage

1

Lastpage

1

Abstract

Optoelectronic technology often asks for conductive materials transparent to optical radiation like transparent conducting oxides (TCOs). Transparent contacts can sensibly improve efficiency and integration of optoelectronic devices, opening the possibility for new concept designs. We have investigated the feasibility to realize uniform transparent electrodes by sputtering deposition of ultra-thin metal films. In order to have an optical transmittance >60% and low resistance, metal films should be continuous with a thickness below 100A. We have studied thin film properties of a selection of metals (nickel, aluminum, titanium, chromium) deposited with a batch sputtering system customized for process manufacturing. The final goal is to define an industrial technology for the realization of transparent metal electrodes.

Keywords

electrodes; metallic thin films; optical films; optical materials; optoelectronic devices; sputter deposition; batch sputtering; industrial technology; optical transmittance; optoelectronic devices; process manufacturing; sputtering deposition; transparent conducting oxides; transparent conductive layers; transparent metal electrodes; ultra thin metal films; Aluminum; Conducting materials; Conductive films; Electrodes; Nickel; Optical films; Optical materials; Optical sensors; Optoelectronic devices; Sputtering;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2007 and the International Quantum Electronics Conference. CLEOE-IQEC 2007. European Conference on

Conference_Location

Munich

Print_ISBN

978-1-4244-0931-0

Electronic_ISBN

978-1-4244-0931-0

Type

conf

DOI

10.1109/CLEOE-IQEC.2007.4386181

Filename

4386181