Title :
Fabrication of nanostructured titania thin film at low temperature
Author :
Tang, Guanrong ; Chen, Jing
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
Abstract :
Nanostructured titania (NST) is attracting more and more attention due to its porousness and high surface to volume ratio. A novel process to fabricate integrated NST thin film at low temperature (80-90°C) is presented. NST features were formed by oxidizing Ti films in aqueous hydrogen peroxide. The optimal conditions of aqueous oxidation are: 85°C, aqueous 10% H2O2 solution, 20 min of water bath time. Crack-free NST features of 100 ¿m × 100 ¿m were successfully fabricated. Two polymer masking materials, SU8 and Parylene, were proved to be compatible with this process, selective NST oxidation could be carried out at an ultra low temperature below 100°C.
Keywords :
nanostructured materials; oxidation; thin films; titanium compounds; aqueous hydrogen peroxide; aqueous oxidation; nanostructured titania thin film; oxidizing films; parylene; polymer masking materials; temperature 80 degC to 90 degC; temperature 85 degC; time 20 min; water bath time; Biological materials; Fabrication; Microelectronics; Nanobioscience; Nanostructured materials; Oxidation; Surface cracks; Temperature; Titanium; Transistors; Aqueous oxidation; NST; masking material;
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-2185-5
Electronic_ISBN :
978-1-4244-2186-2
DOI :
10.1109/ICSICT.2008.4735103
