Micro structuring of photoresist with femtosecond laser pulses

Author

Zoppel, S. ; Partel, S. ; Choleva, P. ; Hudek, P. ; Huber, H. ; Lederer, M. ; Der Au, J. Aus ; Reider, G.A.

Author_Institution

Vienna Univ. of Technol., Vienna

fYear

2007

fDate

17-22 June 2007

Firstpage

1

Lastpage

1

Abstract

Femtosecond laser pulses permit laser ablation almost free of any heat load to the material, which allows the structuring of various materials with high resolution and good edge definition. We present recent results on selective laser ablation of thick photoresists (AZ-Types) from dielectric substrates as a critical process step in MEMS (micro electromechanical systems) fabrication, capitalizing on the different ablation thresholds of the resist layer and the substrate material. The laser used was an ultrafast pulsed Yb:glass regenerative amplifier with a pulse duration of 300 fs.

Keywords

high-speed optical techniques; laser ablation; micromechanical devices; photoresists; solid lasers; ytterbium; JkJk:Yb; MEMS fabrication; dielectric substrates; femtosecond laser pulses; laser ablation; laser microstructuring; micro electromechanical systems; photoresist; time 300 fs; ultrafast pulsed regenerative amplifier; Dielectric materials; Dielectric substrates; Electromechanical systems; Laser ablation; Micromechanical devices; Optical device fabrication; Optical materials; Optical pulses; Pulse amplifiers; Resists;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2007 and the International Quantum Electronics Conference. CLEOE-IQEC 2007. European Conference on

Conference_Location

Munich

Print_ISBN

978-1-4244-0931-0

Electronic_ISBN

978-1-4244-0931-0

Type

conf

DOI

10.1109/CLEOE-IQEC.2007.4386293

Filename

4386293