Title :
Accelerated optical topography inspection using parameterized model order reduction
Author :
Lee, Jung Hoon ; Vasilyev, Dimitry ; Vithayathil, Anne ; Daniel, Luca ; White, Jacob
Author_Institution :
Electr. Eng. & Comput. Sci., Massachusetts Inst. of Technol., Cambridge, MA, USA
Abstract :
This paper describes an efficient method for solving an inverse optical scattering problem associated with the optical semiconductor process inspection. The method determines the geometric features of a fabricated structure, from spectroscopic ellipsometry measurements, by combining a parameterized low-order model with an optimization algorithm. We make improvements on the polynomial fitting-based parameterized moment matching technique to extract such model automatically. Since the resulting model is inexpensive to evaluate, the method shows large speedup without losing much accuracy: the examples show more than 1000 times speedup with less than 1% error in the final geometric parameter estimation.
Keywords :
boundary-elements methods; ellipsometry; inspection; light scattering; optimisation; process monitoring; reduced order systems; semiconductor technology; accelerated optical topography inspection; inverse optical scattering problem; optical semiconductor process inspection; optimization algorithm; parameterized low-order model; parameterized model order reduction; parameterized moment matching; polynomial fitting; spectroscopic ellipsometry; Acceleration; Automatic optical inspection; Ellipsometry; Geometrical optics; Optical scattering; Optimization methods; Semiconductor process modeling; Solid modeling; Spectroscopy; Surfaces;
Conference_Titel :
Microwave Symposium Digest, 2005 IEEE MTT-S International
Print_ISBN :
0-7803-8845-3
DOI :
10.1109/MWSYM.2005.1517065