• DocumentCode
    2168384
  • Title

    Metamorphic HEMT Technology for Microwave, Millimeter-Wave, and Submillimeter-Wave Applications

  • Author

    Komiak, J.J. ; Smith, P.M. ; Duh, K.H.G. ; Xu, D. ; Chao, P.C.

  • Author_Institution
    Electron. Syst., BAE Syst., Nashua, NH, USA
  • fYear
    2013
  • fDate
    13-16 Oct. 2013
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    This paper reviews recent progress in the development of GaAs Metamorphic HEMT (MHEMT) technology for microwave, millimeter-wave, and submillimeter-wave applications. Short gate-length (50-100 nm) Metamorphic High Electron Mobility Transistors have been optimized for high gain and low noise performance. Efforts to further improve performance, manufacturability, and verify reliability will be reported. We also describe the design and performance of low noise MMIC amplifiers based on this technology.
  • Keywords
    HEMT integrated circuits; III-V semiconductors; MMIC amplifiers; gallium arsenide; low noise amplifiers; GaAs; low noise MMIC amplifiers; low noise performance; metamorphic HEMT technology; metamorphic high electron mobility transistors; microwave applications; size 50 nm to 100 nm; submillimeter-wave applications; Gallium arsenide; Indium phosphide; Logic gates; MMICs; Noise; mHEMTs;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Compound Semiconductor Integrated Circuit Symposium (CSICS), 2013 IEEE
  • Conference_Location
    Monterey, CA
  • Type

    conf

  • DOI
    10.1109/CSICS.2013.6659237
  • Filename
    6659237