• DocumentCode
    2170346
  • Title

    Ultra-thin RF LDMOS Power Transistors

  • Author

    Herbsommer, J.A. ; Safar, H. ; Brown, W. ; Gammel, P. ; Lopez, O. ; Terefenko, G.

  • Author_Institution
    Agere Systems, 700 Mountain Ave. Murray Hill NJ 07974, USA.
  • fYear
    2002
  • fDate
    23-26 Sept. 2002
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    We present the electrical and thermal performance of ultra-thin RF LDMOS devices. Following a proprietary process, we fabricated such devices with a thickness as reduced as 40¿m. This results in a reduction of the operating junction temperature, as demonstrated by infrared imaging experiments and three-dimensional finite-element-analysis simulations. As a result, the thermal resistance of our packaged devices reaches substantially lower values than industry standard. This allows for a higher power output and improved efficiency, as demonstrated by RF measurements.
  • Keywords
    Electric resistance; Electrical resistance measurement; Finite element methods; Infrared imaging; Packaging; Power measurement; Power transistors; Radio frequency; Temperature; Thermal resistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Conference, 2002. 32nd European
  • Conference_Location
    Milan, Italy
  • Type

    conf

  • DOI
    10.1109/EUMA.2002.339276
  • Filename
    4140356