DocumentCode
2170346
Title
Ultra-thin RF LDMOS Power Transistors
Author
Herbsommer, J.A. ; Safar, H. ; Brown, W. ; Gammel, P. ; Lopez, O. ; Terefenko, G.
Author_Institution
Agere Systems, 700 Mountain Ave. Murray Hill NJ 07974, USA.
fYear
2002
fDate
23-26 Sept. 2002
Firstpage
1
Lastpage
4
Abstract
We present the electrical and thermal performance of ultra-thin RF LDMOS devices. Following a proprietary process, we fabricated such devices with a thickness as reduced as 40¿m. This results in a reduction of the operating junction temperature, as demonstrated by infrared imaging experiments and three-dimensional finite-element-analysis simulations. As a result, the thermal resistance of our packaged devices reaches substantially lower values than industry standard. This allows for a higher power output and improved efficiency, as demonstrated by RF measurements.
Keywords
Electric resistance; Electrical resistance measurement; Finite element methods; Infrared imaging; Packaging; Power measurement; Power transistors; Radio frequency; Temperature; Thermal resistance;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Conference, 2002. 32nd European
Conference_Location
Milan, Italy
Type
conf
DOI
10.1109/EUMA.2002.339276
Filename
4140356
Link To Document