Ion sources for commercial ion implanter applications

The authors review some of the history as well as recent developments in the implanter ion source field. It is noted that ion sources for implantation have changed considerably since implantation was first used commercially. Dramatic increases in beam output have been sustained with each new generation of ion implanters. In addition to the drive for improved beam currents, the need of the implant users for reliable long-life operation has driven much of the new development in implanter ion sources. In addition, the opportunity to achieve new capabilities, such as buried oxide layers, has sparked novel ion source designs to answer the demand. Particular attention is given here to microwave ion sources, the single ring cusp ion source, and multicusp ion sources.<>