• DocumentCode
    2183196
  • Title

    Device Performance of Graphene Nanoribbon Field Effect Transistors with Edge Roughness Effects: A Computational Study

  • Author

    Leong, Zuan-Yi ; Lam, Kai-Tak ; Liang, Gengchiau

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Nat. Univ. of Singapore, Singapore
  • fYear
    2009
  • fDate
    27-29 May 2009
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    The device performance of armchair edge graphene nanoribbon Schottky barrier field effect transistors (A-GNR SBFETs) over different edge roughness and widths are investigated over a wide range of devices in terms of ION/IOFF. Generally, wider GNRs outperform narrower GNRs in the presence of edge roughness effects with average leakage current reduced up to ~400% less. The average leakage current for 2.2 nm width GNR SBFETs increased 2.7 times when edge roughness increased from 5% to 10%, while the same for 1.4 nm widths increased 11.2 times In addition, a small amount of ER of 5% is well tolerated by all GNR SBFETs, with the average ION/IOFF lowered from 4012 to 3075 for 1.4 nm widths. However, a further increase in ER to 20% degrades performance greatly, dropping ION/IOFF to 273. The generally reliable performance of GNR SBFETs at small edge irregularities over channel widths is reported and a detailed statistical investigation provided.
  • Keywords
    Green´s function methods; Schottky barriers; Schottky gate field effect transistors; graphene; leakage currents; C; Green´s function formalism; Schottky barrier field effect transistors; armchair edge graphene nanoribbon; edge roughness effects; graphene nanoribbon field effect transistors; leakage current; size 1.4 nm; Bonding; Erbium; FETs; Green´s function methods; High performance computing; Leakage current; Nanoscale devices; Optical computing; Photonic band gap; Schottky barriers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Computational Electronics, 2009. IWCE '09. 13th International Workshop on
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-3925-6
  • Electronic_ISBN
    978-1-4244-3927-0
  • Type

    conf

  • DOI
    10.1109/IWCE.2009.5091104
  • Filename
    5091104