• DocumentCode
    2203124
  • Title

    Microstructure of polycrystalline GaN grown on silica glass by ECR-MBE

  • Author

    Araki, T. ; Ueno, T. ; Ueta, S. ; Nanishi, Y.

  • Author_Institution
    Dept. of Photonics, Ritsumeikan Univ., Kusatsu, Japan
  • fYear
    2003
  • fDate
    25-27 Aug. 2003
  • Firstpage
    25
  • Lastpage
    26
  • Abstract
    We have investigated GaN grown on silica glass using TEM. Polycrystalline GaN grown without nitridation shows columnar structure with distributed growth orientation, in which threading dislocation density is relatively low. On the other hand, polycrystalline GaN grown with nitridation has columnar structure with uniform c-axis orientation. However, a high density of threading dislocation is observed.
  • Keywords
    III-V semiconductors; crystal microstructure; dislocation density; gallium compounds; semiconductor epitaxial layers; transmission electron microscopy; wide band gap semiconductors; ECR-MBE; GaN; TEM; columnar structure; dislocation density; electron cyclotron resonance; microstructure; nitridation; polycrystalline GaN growth; silica glass; Amorphous materials; Buffer layers; Gallium nitride; Glass; Microstructure; Optical materials; Plasma properties; Silicon compounds; Substrates; Surface morphology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Compound Semiconductors, 2003. International Symposium on
  • Print_ISBN
    0-7803-7820-2
  • Type

    conf

  • DOI
    10.1109/ISCS.2003.1239888
  • Filename
    1239888