DocumentCode
2203124
Title
Microstructure of polycrystalline GaN grown on silica glass by ECR-MBE
Author
Araki, T. ; Ueno, T. ; Ueta, S. ; Nanishi, Y.
Author_Institution
Dept. of Photonics, Ritsumeikan Univ., Kusatsu, Japan
fYear
2003
fDate
25-27 Aug. 2003
Firstpage
25
Lastpage
26
Abstract
We have investigated GaN grown on silica glass using TEM. Polycrystalline GaN grown without nitridation shows columnar structure with distributed growth orientation, in which threading dislocation density is relatively low. On the other hand, polycrystalline GaN grown with nitridation has columnar structure with uniform c-axis orientation. However, a high density of threading dislocation is observed.
Keywords
III-V semiconductors; crystal microstructure; dislocation density; gallium compounds; semiconductor epitaxial layers; transmission electron microscopy; wide band gap semiconductors; ECR-MBE; GaN; TEM; columnar structure; dislocation density; electron cyclotron resonance; microstructure; nitridation; polycrystalline GaN growth; silica glass; Amorphous materials; Buffer layers; Gallium nitride; Glass; Microstructure; Optical materials; Plasma properties; Silicon compounds; Substrates; Surface morphology;
fLanguage
English
Publisher
ieee
Conference_Titel
Compound Semiconductors, 2003. International Symposium on
Print_ISBN
0-7803-7820-2
Type
conf
DOI
10.1109/ISCS.2003.1239888
Filename
1239888
Link To Document