Title :
Pulsed laser annealing of zinc - implanted InP
Author :
Chao, Chen ; Markevich, M.I. ; Piskonov, E.A. ; Chaplanov, A.M. ; Ivlev, G.D.
Author_Institution :
Dept. of Phys., Xiamen Univ., China
Abstract :
The pulsed laser annealing technique can eliminate many induced defects from zinc-implantation InP and change amorphous into mono-crystal on the surface of InP sample. The optimal annealing condition for pulsed ruby laser is that laser power density is about 0-44J/cm2 and time width is 70 ns. If the pulsed laser radiating power density is too high or too low, the surface of sample will produce poly-crystal. On the optimal annealing condition, the shallow p-n junction and the high precipitous accepter concentration distribution have been obtained. The maximum accepter concentration will exceed 1019cm-3. The junction depth is less than 0.12 μm. The proposed macro-kinetic model can be employed to explain the phenomenon and the physical processes in pulsed laser annealing
Keywords :
crystal defects; indium compounds; ion implantation; laser beam annealing; semiconductor process modelling; zinc; 0.12 micron; 70 ns; InP:Zn; accepter concentration distribution; induced defects; junction depth; laser power density; macro-kinetic model; optimal annealing; polycrystal; pulsed laser; pulsed laser annealing; pulsed ruby laser; time width 70 ns; Amorphous materials; Annealing; Indium phosphide; Laser transitions; Optical pulses; P-n junctions; Power lasers; Space vector pulse width modulation; Surface emitting lasers; Zinc;
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2001. Proceedings. 6th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
0-7803-6520-8
DOI :
10.1109/ICSICT.2001.981471