Title :
Calculation of the effect of electron correlations on shot noise in gyroklystrons
Author :
Fliflet, Arne W. ; Antonsen, T.M. ; Calame, Jeffrey P. ; Danly, B.G.
Author_Institution :
Vacuum Electron. Branch, Naval Res. Lab., Washington, DC, USA
Abstract :
Summary form only given, as follows. The results of a theory of shot noise amplification and damping in gyro-amplifiers are compared with measurements for a 35 GHz gyroklystron. The theory models the evolution of the electrostatic cyclotron instability and the development of dielectric screening in the electron gun and interaction cavity regions. These effects modify the "bare" shot noise produced by uncorrelated electrons. The approach is based on the linearized Vlasov equation from plasma kinetic theory. The Vlasov equation is expressed in terms of the interaction potential observed by a test particle in the electron beam. Noise fluctuations are represented by the perturbed distribution function. The model includes the effects of the nonzero transverse size of the electron beam as well as the axial profile of the applied magnetic field.
Keywords :
Vlasov equation; electron correlations; gyrotrons; klystrons; microwave amplifiers; plasma fluctuations; plasma kinetic theory; shot noise; 35 GHz; applied magnetic field; damping; dielectric screening; electron beam; electron correlations; electron gun; electrostatic cyclotron instability; gyro-amplifiers; gyroklystrons; interaction cavity regions; interaction potential; linearized Vlasov equation; models; noise fluctuations; nonzero transverse size; perturbed distribution function; plasma kinetic theory; shot noise amplification; test particle; Cyclotrons; Damping; Dielectric measurements; Electron beams; Electrostatic measurements; Equations; Kinetic theory; Klystrons; Noise measurement; Plasma displays;
Conference_Titel :
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location :
New Orleans, LA, USA
Print_ISBN :
0-7803-5982-8
DOI :
10.1109/PLASMA.2000.855001