Title :
Implementation of In-Line TDDB Testing for Gate Oxide Reliability Improvement
Author :
Aldridge, Bruce ; Zeglinski, David ; Vadipour, Mostafa
Author_Institution :
Western Digital Corporation
Keywords :
CMOS technology; Capacitors; Dielectrics; Electric breakdown; Failure analysis; Manufacturing; Measurement standards; Monitoring; Production control; Testing;
Conference_Titel :
Integrated Reliability Workshop Final Report, 1993 International
DOI :
10.1109/IRWS.1993.666294
