DocumentCode
2212151
Title
Multiple beam guns for high power RF sources
Author
Ives, R. Lawrence ; Miram, G. ; Marsden, D. ; Mizuhara, Maxwell ; Krasnyhk, A. ; Ivanov, V.
Author_Institution
Calabazas Creek Res., Saratoga, CA, USA
fYear
2002
fDate
26-30 May 2002
Firstpage
279
Abstract
Summary form only given, as follows. Calabazas Creek Research, Inc.(CCR) is funded by the US Department of Energy (DOE) and the Office of Naval Research (ONR) to develop multiple beam electron guns (MBGs) for high power RF sources. The DOE program is tasked with development of an MBG for a 50-100 MW, X-Band klystron for the next generation of high energy accelerators and colliders. The ONR program will design an MBG for a multi-megawatt, S-Band RF source for radar applications. Multiple beam RF sources operate at significantly lower beam voltage than equivalent single beam devices. The reduction in beam voltage improves efficiency, increases bandwidth, and reduces the length of klystrons and traveling wave tubes. More significantly, the reduced voltage simplifies the power supply system and reduces generation of X-rays. For 50-100 MW sources, the reduced voltage allows operation with solid state power supplies. This significantly increases the power supply efficiency and dramatically lowers the cost by eliminating the pulse modulator.
Keywords
electron guns; klystrons; microwave generation; microwave tubes; power supplies to apparatus; travelling wave tubes; 50 to 100 MW; Office of Naval Research; US Department of Energy; X-Band klystron; beam voltage; cost; high energy accelerators; high energy colliders; high power RF sources; klystrons; multi-megawatt S-Band RF source; multiple beam RF sources; multiple beam electron guns; multiple beam guns; operation; power supply efficiency; pulse modulator; radar applications; reduced voltage; solid state power supplies; traveling wave tubes; Colliding beam accelerators; Electron beams; Electron guns; Klystrons; Power supplies; Pulse modulation; Pulsed power supplies; Radio frequency; US Department of Energy; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
Conference_Location
Banff, Alberta, Canada
Print_ISBN
0-7803-7407-X
Type
conf
DOI
10.1109/PLASMA.2002.1030576
Filename
1030576
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