• DocumentCode
    2220397
  • Title

    Electron field emission from silicon nanoprotrusions

  • Author

    Tabe, Michiharu ; Sawada, Kazuaki ; Ishikawa, Yasuhiko ; Ishida, Makoto

  • Author_Institution
    Res. Inst. of Electron., Shizuoka Univ., Hamamatsu, Japan
  • Volume
    2
  • fYear
    2001
  • fDate
    22-25 Oct. 2001
  • Firstpage
    1378
  • Abstract
    Recently, enhanced field emission of electrons from a variety of nanostructured materials such as carbon nanotubes, and porous Si has been extensively studied for application to displays and other vacuum electronic devices. In this work, we have studied field emission of electrons by using a diode experimental setup without gate electrodes from the most fundamental Si nanostructure, i.e., Si nanoprotrusions with both vertical and lateral sizes of 10∼20 nm and the density of 3∼5×1011 cm-2. The protrusions were fabricated by our original self-organized selective oxidation technique, referred to as "nano-LOCOS". Although the Si protrusions were quite small, high emission current was detected at low anode voltages, depending on the microscopic shape controlled by oxidation conditions. This result encourages us to develop "bright" and "highly functional" electron emitting devices using the Si nanosystem.
  • Keywords
    electron field emission; elemental semiconductors; nanostructured materials; oxidation; silicon; Si; Si nanoprotrusions; electron field emission; emission current; low anode voltage; microscopic shape; nano-LOCOS; self-organized selective oxidation; silicon nanoprotrusions; Anodes; Carbon nanotubes; Diodes; Electrodes; Electron emission; Flat panel displays; Nanostructured materials; Oxidation; Shape control; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated-Circuit Technology, 2001. Proceedings. 6th International Conference on
  • Print_ISBN
    0-7803-6520-8
  • Type

    conf

  • DOI
    10.1109/ICSICT.2001.982158
  • Filename
    982158