DocumentCode
2220397
Title
Electron field emission from silicon nanoprotrusions
Author
Tabe, Michiharu ; Sawada, Kazuaki ; Ishikawa, Yasuhiko ; Ishida, Makoto
Author_Institution
Res. Inst. of Electron., Shizuoka Univ., Hamamatsu, Japan
Volume
2
fYear
2001
fDate
22-25 Oct. 2001
Firstpage
1378
Abstract
Recently, enhanced field emission of electrons from a variety of nanostructured materials such as carbon nanotubes, and porous Si has been extensively studied for application to displays and other vacuum electronic devices. In this work, we have studied field emission of electrons by using a diode experimental setup without gate electrodes from the most fundamental Si nanostructure, i.e., Si nanoprotrusions with both vertical and lateral sizes of 10∼20 nm and the density of 3∼5×1011 cm-2. The protrusions were fabricated by our original self-organized selective oxidation technique, referred to as "nano-LOCOS". Although the Si protrusions were quite small, high emission current was detected at low anode voltages, depending on the microscopic shape controlled by oxidation conditions. This result encourages us to develop "bright" and "highly functional" electron emitting devices using the Si nanosystem.
Keywords
electron field emission; elemental semiconductors; nanostructured materials; oxidation; silicon; Si; Si nanoprotrusions; electron field emission; emission current; low anode voltage; microscopic shape; nano-LOCOS; self-organized selective oxidation; silicon nanoprotrusions; Anodes; Carbon nanotubes; Diodes; Electrodes; Electron emission; Flat panel displays; Nanostructured materials; Oxidation; Shape control; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated-Circuit Technology, 2001. Proceedings. 6th International Conference on
Print_ISBN
0-7803-6520-8
Type
conf
DOI
10.1109/ICSICT.2001.982158
Filename
982158
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