Title :
Thermal Stability of PECVD SiNx Films
Author :
Jehanathan, Neerushana ; Liu, Yinong ; Walmsley, Byron ; Dell, John ; Faraone, Lorenzo
Author_Institution :
Sch. of Mech. Eng., Western Australia Univ., Crawley, WA
Abstract :
This study investigates the effect of oxidation on the structural integrity of PECVD SiNx thin films at elevated temperatures in dry air, by means of scanning electron microscopy (SEM), Fourier transform infrared spectroscopy and nanoindentation measurement. It is found the heating to elevated temperatures results in the replacement of the nitrogen content in the films by oxygen, implying an oxidation process. SEM examination revealed that the surface of the films is severely damaged, mostly in the form of circular in-plane cracks, as a result of the oxidation heating. This in turn leads to high scattering of the nanoindentation measurement of mechanical properties
Keywords :
Fourier transform spectroscopy; cracks; indentation; infrared spectroscopy; oxidation; plasma CVD; scanning electron microscopy; silicon compounds; thermal stability; thin films; SiN; This study investigates the effect of oxidation on the structural integrity of PECVD SiNx thin films at elevated temperatures in dry air, by means of scanning electron microscopy (SEM), Fourier transform infrared spectroscopy and nanoindentation measurement. It is found the heating to elevated temperatures results in the replacement of the nitrogen content in the films by oxygen, implying an oxidation process. SEM examination revealed that the surface of the films is severely damaged,; Fourier transforms; Heating; Infrared spectra; Nitrogen; Oxidation; Scanning electron microscopy; Silicon compounds; Temperature; Thermal stability; Transistors;
Conference_Titel :
Nanoscience and Nanotechnology, 2006. ICONN '06. International Conference on
Conference_Location :
Brisbane, Qld.
Print_ISBN :
1-4244-0453-3
Electronic_ISBN :
1-4244-0453-3
DOI :
10.1109/ICONN.2006.340554
