DocumentCode
2224872
Title
An object-based approach to optical proximity correction
Author
Yang, Changqi ; Hong, Xianlong ; Wu, Weimin ; Cai, Yici ; Shi, Rui
Author_Institution
Tsinghua Univ., Beijing, China
fYear
2001
fDate
2001
Firstpage
206
Lastpage
209
Abstract
As the feature sizes of integrated circuits have been continually reducing to below exposure wavelength, some correcting techniques, such as OPC and PSM are indispensable to compensate for the distortions on wafer images. In this paper, we describe an object-based approach to OPC named OPCM, which is a model-based OPC tool. Also, a rule-based OPC has been adopted to enhance the practicability of the software
Keywords
object-oriented methods; proximity effect (lithography); semiconductor process modelling; OPC; OPCM; distortions; exposure wavelength; feature sizes; object-based approach; optical proximity correction; practicability; wafer images; Computational modeling; Diffraction; Light scattering; Optical design; Optical distortion; Optical scattering; Resists; Semiconductor device modeling; Simulated annealing; Software libraries;
fLanguage
English
Publisher
ieee
Conference_Titel
ASIC, 2001. Proceedings. 4th International Conference on
Conference_Location
Shanghai
Print_ISBN
0-7803-6677-8
Type
conf
DOI
10.1109/ICASIC.2001.982533
Filename
982533
Link To Document