• DocumentCode
    2226321
  • Title

    Multi-layer low-temperature deposited CMOS photonics for microelectronics backend integration

  • Author

    Sherwood-Droz, Nicolás ; Lipson, Michal

  • Author_Institution
    Sch. of Electr. & Comput. Eng., Cornell Univ., Ithaca, NY, USA
  • fYear
    2011
  • fDate
    1-6 May 2011
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We experimentally show vertically-stacked, multi-layer, low-temperature deposited photonics for integration on processed electronics. Waveguides, microrings, and crossings are fabricated out of 400°C PECVD Si3N4, in a two layer configuration.
  • Keywords
    CMOS integrated circuits; integrated optics; Si3N4; crossings; microelectronics backend integration; microrings; multilayer low-temperature deposited CMOS photonics; temperature 400 degC; two layer configuration; waveguides; CMOS process; Optical films; Optical imaging; Optical resonators; Optical waveguides; Photonics; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2011 Conference on
  • Conference_Location
    Baltimore, MD
  • Print_ISBN
    978-1-4577-1223-4
  • Type

    conf

  • Filename
    5950075