DocumentCode
2228558
Title
Lamb waves pressure sensor using an AlN/Si structure
Author
Choujaa, A. ; Hauden, D. ; Martin, G. ; Blind, P.
fYear
1993
fDate
31 Oct-3 Nov 1993
Firstpage
371
Abstract
Among sensors using a thin membrane covered with a piezoelectric layer, we focused on the study of a pressure sensor using an AlN film over a silicon membrane. The membrane was micromachined using both anisotropic and isotropic chemical etchings. The AlN thin film was deposited by a sputtering method with very good stochiometric results. Elastic waves were generated and detected through IDT transducers calculated at a frequency of 88 MHz for the SO Lamb wave mode. We studied the velocity and the electromechanical coupling factor of the first symmetric and antisymmetric Lamb modes according to the thickness of the piezoelectric layer. The pressure and the temperature behavior of such a sensor using the SO Lamb mode are presented. We have analysed the pressure sensitivity and we propose some solutions to obtain a well temperature compensated structure. Especially, we were thinking to achieve a self-compensated structure by using the opposite temperature behavior of silicon and AlN
Keywords
piezoelectric transducers; pressure sensors; surface acoustic wave devices; ultrasonic transducers; AlN; AlN film; AlN/Si; Lamb wave; SO Lamb wave; Si; Si membrane; antisymmetric Lamb mode; electromechanical coupling factor; pressure sensitivity; pressure sensor; sputtering; symmetric Lamb mode; temperature; velocity; Anisotropic magnetoresistance; Biomembranes; Chemical sensors; Piezoelectric films; Semiconductor films; Silicon; Sputter etching; Sputtering; Temperature sensors; Thin film sensors;
fLanguage
English
Publisher
ieee
Conference_Titel
Ultrasonics Symposium, 1993. Proceedings., IEEE 1993
Conference_Location
Baltimore, MD
Print_ISBN
0-7803-2012-3
Type
conf
DOI
10.1109/ULTSYM.1993.339466
Filename
339466
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