Title :
MEMS reflective type variable optical attenuator using off-axis misalignment
Author :
Che-Heung Kim ; Namkyoo Park ; Yong-Kweon Kim
Author_Institution :
Sch. of Electr. Eng. & Comput. Sci., Seoul Nat. Univ., South Korea
Abstract :
This paper proposes a reflective type microelectromechanical system variable optical attenuator (MEMS VOA) which uses 45 degree tilted vertical movable mirror fabricated by a deep reactive ion etching (DRIE). The optical attenuation is generated by an optical axis offset controlled by the vertical mirror. Fibers are aligned passively on the vertical grooves which are formed at the same plane with the control actuator.
Keywords :
micro-optics; micromirrors; optical attenuators; sputter etching; MEMS reflective-type variable optical attenuator; deep reactive ion etching; off-axis misalignment; vertical movable mirror; Micromechanical devices; Mirrors; Optical attenuators; Optical control; Optical fiber devices; Optical fiber polarization; Optical fibers; Optical losses; Particle beam optics; Wavelength division multiplexing;
Conference_Titel :
Optical MEMs, 2002. Conference Digest. 2002 IEEE/LEOS International Conference on
Conference_Location :
Lugano, Switzerland
Print_ISBN :
0-7803-7595-5
DOI :
10.1109/OMEMS.2002.1031440
