DocumentCode :
2238072
Title :
High temperature static and dynamic characteristics of 3.7 kV high voltage 4H-SiC JBS
Author :
Asano, Katsunori ; Hayashi, Toshihiko ; Saito, Ryuichi ; Sugawara, Yoshitaka
Author_Institution :
Tech. Res. Center, Kansai Electr. Power Co. Inc., Amagasaki, Japan
fYear :
2000
fDate :
2000
Firstpage :
97
Lastpage :
100
Abstract :
A new high voltage Junction Barrier controlled Schottky (JBS) diode has been fabricated using 4H-SiC. This diode has some field reduction regions in the active area of a Schottky barrier diode (SBD). These regions can reduce the electric field at the Schottky barrier in the reverse blocking state, and can reduce the leakage current. By adopting the proper SBD metal, fine patterning and optimized structures, we succeeded in improving the trade-off between the blocking voltage (BV) and the specific on-resistance, and achieved a new record high BV of 3.7-3.9 kV and top-level specific on-resistance of 31.4-40.2 mΩcm2 for the first time. The newly developed JBS has a very fast recovery time tττ of 9.7 ns, which is about 10% that of the Si high-speed diode tττ and high voltage 4H-SiC pn diode. Furthermore, the dynamic characteristics of the developed JBS are almost constant at high temperatures up to 550 K
Keywords :
Schottky diodes; silicon compounds; wide band gap semiconductors; 3.7 kV; 3.7 kV high voltage 4H-SiC JBS; 9.7 ns; Junction Barrier controlled Schottky diode; SiC; active area; blocking voltage; dynamic characteristics; electric field; field reduction regions; fine patterning; leakage current; optimized structures; reverse blocking state; specific on-resistance; static characteristics; top-level specific on-resistance; Cooling; Epitaxial layers; Frequency conversion; Leakage current; Power conversion; Schottky barriers; Schottky diodes; Silicon carbide; Temperature dependence; Voltage control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs, 2000. Proceedings. The 12th International Symposium on
Conference_Location :
Toulouse
ISSN :
1063-6854
Print_ISBN :
0-7803-6269-1
Type :
conf
DOI :
10.1109/ISPSD.2000.856781
Filename :
856781
Link To Document :
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