• DocumentCode
    2238705
  • Title

    Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing

  • Author

    Yatsui, T. ; Nomura, W. ; Ohtsu, M. ; Hirata, K. ; Tabata, Y.

  • Author_Institution
    SORST, Japan Sci. & Technol. Agency, Tokyo
  • fYear
    2008
  • fDate
    4-9 May 2008
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We report that nanophotonic polishing of a silica substrate using a nonadiabatic photochemical reaction drastically reduced the average surface roughness, R a, and the dispersion of R a.
  • Keywords
    nanotechnology; photochemistry; polishing; silicon compounds; surface roughness; SiO2; average surface roughness; dispersion; nanophotonic polishing; nonadiabatic photochemical reaction; ultraflat silica surface; Absorption; Atom optics; Dispersion; Etching; Optical surface waves; Photochemistry; Rough surfaces; Silicon compounds; Surface emitting lasers; Surface roughness; (220.5450) Polishing; (350.5130) Photochemistry;
  • fLanguage
    English
  • Publisher
    iet
  • Conference_Titel
    Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-55752-859-9
  • Type

    conf

  • Filename
    4571560
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2238705