• DocumentCode
    2239684
  • Title

    Electromigration reliability enhancement via bus activity distribution

  • Author

    Dasgupta, Aurobindo ; Karri, Ramesh

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Massachusetts Univ., Amherst, MA, USA
  • fYear
    1996
  • fDate
    3-7 Jun, 1996
  • Firstpage
    353
  • Lastpage
    356
  • Abstract
    Electromigration induced degradation in integrated circuits has been accelerated by continuous scaling of device dimensions. We present a methodology for synthesizing high-reliability and low-energy microarchitectures at the RT level by judiciously binding and scheduling the data transfers of a control data flow graph (CDFG) representation of the application onto the buses in the microarchitecture. The proposed method accounts for correlations between data transfers and the constraints on the number of buses, area and delay
  • Keywords
    integrated circuit design; RT level; bus activity distribution; control data flow graph; data transfers; electromigration induced degradation; electromigration reliability enhancement; integrated circuits; low-energy microarchitectures; scheduling; Clocks; Conductors; Current density; Design automation; Electromigration; Electrons; Equations; Integrated circuit interconnections; Microarchitecture; Permission;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design Automation Conference Proceedings 1996, 33rd
  • Conference_Location
    Las Vegas, NV
  • ISSN
    0738-100X
  • Print_ISBN
    0-7803-3294-6
  • Type

    conf

  • DOI
    10.1109/DAC.1996.545600
  • Filename
    545600