DocumentCode
2239684
Title
Electromigration reliability enhancement via bus activity distribution
Author
Dasgupta, Aurobindo ; Karri, Ramesh
Author_Institution
Dept. of Electr. & Comput. Eng., Massachusetts Univ., Amherst, MA, USA
fYear
1996
fDate
3-7 Jun, 1996
Firstpage
353
Lastpage
356
Abstract
Electromigration induced degradation in integrated circuits has been accelerated by continuous scaling of device dimensions. We present a methodology for synthesizing high-reliability and low-energy microarchitectures at the RT level by judiciously binding and scheduling the data transfers of a control data flow graph (CDFG) representation of the application onto the buses in the microarchitecture. The proposed method accounts for correlations between data transfers and the constraints on the number of buses, area and delay
Keywords
integrated circuit design; RT level; bus activity distribution; control data flow graph; data transfers; electromigration induced degradation; electromigration reliability enhancement; integrated circuits; low-energy microarchitectures; scheduling; Clocks; Conductors; Current density; Design automation; Electromigration; Electrons; Equations; Integrated circuit interconnections; Microarchitecture; Permission;
fLanguage
English
Publisher
ieee
Conference_Titel
Design Automation Conference Proceedings 1996, 33rd
Conference_Location
Las Vegas, NV
ISSN
0738-100X
Print_ISBN
0-7803-3294-6
Type
conf
DOI
10.1109/DAC.1996.545600
Filename
545600
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