• DocumentCode
    2239720
  • Title

    Heterogeneous BiCMOS technologies and circuits and the DARPA Diverse Accessible Heterogeneous Integration (DAHI) program

  • Author

    Raman, Sanjay ; Dohrman, Carl L. ; Chang, Tsu-Hsi

  • Author_Institution
    U.S. Defense Adv. Res. Projects Agency (DARPA), Arlington, VA, USA
  • fYear
    2012
  • fDate
    Sept. 30 2012-Oct. 3 2012
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    The DARPA Diverse Accessible Heterogeneous Integration (DAHI) program is developing transistor-scale heterogeneous integration processes to intimately combine advanced compound semiconductor (CS) devices, as well as other emerging materials and devices, with high-density silicon CMOS technology. This technology is currently enabling BiCMOS RF/mixed signal circuits with revolutionary performance. For example, InP HBT + CMOS technology is being utilized in advanced DACs and ADCs with CMOS-enabled calibration and self-healing techniques for correcting static and dynamic errors in situ. Such CMOS-enabled self-healing techniques will more generally enable improved CS-based circuit performance and yield in the presence of process and environmental variability, as well as aging. DAHI is also expected to enable the integration of high power CS devices with silicon-based linearization techniques to realize highly power efficient transmitters. By enabling this heterogeneous integration capability, DAHI seeks to establish a new paradigm for microsystems designers to utilize a diverse array of materials and device technologies on a common silicon-based platform.
  • Keywords
    BiCMOS integrated circuits; integrated circuit reliability; military equipment; radiofrequency integrated circuits; BiCMOS RF mixed signal circuit; CMOS-enabled self-healing techniques; DAHI program; DARPA Diverse Accessible Heterogeneous Integration program; advanced compound semiconductor device; environmental variability; heterogeneous BiCMOS technology; high density silicon CMOS technology; power efficient transmitter; process variability; transistor scale heterogeneous integration processes; Abstracts; BiCMOS integrated circuits; CMOS integrated circuits; CMOS technology; Compounds; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Bipolar/BiCMOS Circuits and Technology Meeting (BCTM), 2012 IEEE
  • Conference_Location
    Portland, OR
  • ISSN
    1088-9299
  • Print_ISBN
    978-1-4673-3020-6
  • Type

    conf

  • DOI
    10.1109/BCTM.2012.6352654
  • Filename
    6352654